TERRA Analiz ve Ölçüm Cihazları Ticaret A.Ş.

ALD (Atomic Layer Deposition) for Glove Box

Atomic Layess for depositing thin atomic layers; ALD is a particular form of CVD (Chemical Vapour Deposition). The main difference between ALD and generic CVD is the sequential, and not simultaneous, introduction of the precursors into the reaction chamber; Although slower than other techniques, the process provides a better structural quality; Allows deposition of TiO2, Al2O3, SiO2, ZnO, MgO, NiO, SnO2, Nb2O5 layer by layer.r Deposition (ALD) is a...