ALD (Atomic Layer Deposition) for Glove Box
Atomic Layess for depositing thin atomic layers;
ALD is a particular form of CVD (Chemical Vapour Deposition). The main difference between ALD and generic CVD is the sequential, and not simultaneous, introduction of the precursors into the reaction chamber;
Although slower than other techniques, the process provides a better structural quality;
Allows deposition of TiO2, Al2O3, SiO2, ZnO, MgO, NiO, SnO2, Nb2O5 layer by layer.r Deposition (ALD) is a proce
Applications
- Energy
- Laboratories and R&D
- Pharmaceutical & Medical
- Heavy Industry
- Nuclear
Daha fazla bilgi ve teknik detaylar için; buraya tıklayın !
T.G. 280
